The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2001

Filed:

Mar. 15, 2000
Applicant:
Inventors:

Yoshiaki Kawamonzen, Machida, JP;

Shigeru Matake, Yokohama, JP;

Rumiko Hayase, Yokohama, JP;

Satoshi Mikoshiba, Yamato, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/30 ;
Abstract

Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10,] of 5 to 8 within an aqueous solution of 25° C.


Find Patent Forward Citations

Kawamonzen, Yoshiaki. (2001). Developing solution and method of forming polyimide pattern by using the developing solution (U.S. Patent No. 6316170). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6316170

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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