The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Dec. 18, 1995
Applicant:
Inventors:
Andreas M. T. P. Van Der Putten, Eindhoven, NL;
Nicolaas P. Willard, Eindhoven, NL;
Lambertus G. J. Fokkink, Eindhoven, NL;
Ivo G. J. Camps, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 ; B05D 3/06 ;
U.S. Cl.
CPC ...
B05D 5/12 ; B05D 3/06 ;
Abstract
Metal patterns (,) can be provided on a glass substrate (,) in an electroless process by modifying the substrate with a silane layer (,), locally removing said layer with a laser or UV-ozone treatment and selectively nucleating the remaining silane layer in a polymer-stabilized Pd sol. Neither a photoresist nor organic solvents are used. The method is very suitable for the manufacture of the black matrix on a passive plate for an LCD, or on panels of other flat colour displays, such as flat cathode ray tubes.