The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Jul. 10, 1998
Tsungnan Cheng, Saratoga, CA (US);
Ethan C. Wilson, Sunnyvale, CA (US);
Shou-sung Chang, Sunnyvale, CA (US);
Gregory C. Lee, Sunnyvale, CA (US);
Huey M. Tzeng, San Jose, CA (US);
David E. Weldon, Santa Clara, CA (US);
Linh X. Can, San Jose, CA (US);
Luis Lau, Santa Clara, CA (US);
Siyuan Yang, Cupertino, CA (US);
Mosel Vitelic, Inc., Hsinchu, TW;
Abstract
Polishing pads are provided for a linear chemical mechanical polishing apparatus used in manufacturing integrated circuits. The polishing pads, which are attached to a polishing belt, are grooved in patterns to advantageously transport slurry from the point of introduction to the point at which semiconductor wafers are polished. The patterns include at least one set of multiple parallel grooves extending across the polishing pads. The grooves form an angle with the direction of travel of the belt that is unequal to zero.