The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Jan. 21, 2000
Applicant:
Inventor:
Takabumi Marukawa, Tokyo, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract
Minute and uniform line marks can be formed on the surface of a glass substrate for a magnetic disk by pressing a tape planted with hairs against the substrate surface and causing it to run thereover while supplying suspension containing abrading particles and a solution which contains hydroxyl groups such as a KOH solution.
Marukawa, Takabumi. (2001). Method of chemical mechanical texturing (U.S. Patent No. 6315638). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6315638
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile