The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Mar. 16, 2000
Chikashi Oishi, Shizuoka, JP;
Hiroyuki Sasayama, Shizuoka, JP;
Takashi Nakamura, Shizuoka, JP;
Shuichi Takamiya, Shizuoka, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method for developing a material having a photosensitive resin composition or a photosensitive lithographic printing original plate is disclosed, comprising developing a material having a plurality of photosensitive resin composition sheets in sequence with a developer or developing a photosensitive lithographic printing plate precursor with an alkaline developer, wherein the activity of developer is maintained by detecting the exhaustion of developer occurring with the development and passing a current between two electrodes through a developer according to the degree of exhaustion detected. Also disclosed is a development processing apparatus for use in the development of the material having a photosensitive resin composition or the photosensitive lithographic printing plate precursor