The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Jan. 06, 1999
Applicant:
Inventor:
Ryuji Takenouchi, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ; G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/750 ; G06F 1/900 ;
Abstract
A method of generating mask pattern data for graphics and an apparatus for the same are provided wherein each line segment as a processing unit for graphic arithmetic processing is stored as data in tree structure evenly divided into two for every partial region obtained by plurally dividing the overall pattern data, and this partial region is formed by equally dividing the pattern data by m in an X axis direction, and among the regions, those which includes line segments intensively are further divided to form data of tree structure evenly divided into two for every divided region.