The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Mar. 02, 1999
Kenneth Howard Womack, San Diego, CA (US);
Daniel Lee Abraham, Irvine, CA (US);
Veeco Instruments Inc., Plainview, NY (US);
Abstract
The present invention provides a method and apparatus for high precision image metrology. A feature dimension from the image is determined by measuring corresponding features in the Fourier power spectrum of the image with substantially improved precision due to immunity from noise and system response. Operationally, a digital image of the sample is acquired at sufficient resolution to capture the feature of interest. A sample widow is chosen which substantially isolates the feature of interest. The feature window is then piecewise extended to a predetermined window size for effective Fourier Transform interpolation. A Fourier Power Spectrum of the sample widow is generated at high sample density such that the loci of extremal points indicative of a feature dimension is identified with high precision. The relative spacing of the extremal points is measured and related to the desired feature dimension. Utilizing the power spectrum of the image feature in the manner herein disclosed advantageously provides a way to measure feature dimensions with high precision. The method of the present invention is substantially independent of variations in image system performance, typical system noise and sample optical properties.