The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2001

Filed:

Nov. 09, 1999
Applicant:
Inventors:

Zhu Feng, Fremont, CA (US);

Chiu-Shing Frank Poon, Oakland, CA (US);

Tan Guo Liu, San Francisco, CA (US);

Vidya Gubbi, Milpitas, CA (US);

Chung Yuang Shih, Cupertino, CA (US);

Assignee:

Seagate Technology LLC, Scotts Valley, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 2/926 ;
U.S. Cl.
CPC ...
G01R 2/926 ;
Abstract

Disclosed is anew technique for measuring the resistivity of ultra-thin carbon films (less than 200 Å). The technique involves using a probe with very smooth surface, a thin layer lubricant (20-30Å)that enables the intimate and stable electrical contact between probe and the thin film, and measurement of I-V curve to determine resistance. Resistivity measurements were conducted on carbon films doped with hydrogen and nitrogen at different mixture ratios and different thicknesses, and the results were compared with those obtained on a commercially available machine that uses a mercury probe. The advantages of the present technique include simple in use, less expensive and quick measurements with reasonably good accuracy.


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