The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Jan. 21, 1999
Samsung Display Devices Co., LTD, Kyungki-do, KR;
Abstract
A shadow mask includes an aperture portion having a plurality of apertures formed therein, the aperture portion being formed over a predetermined area in a center of the shadow mask; and a non-aperture portion defining a periphery of the shadow mask and formed adjacent to the aperture portion. Only the aperture portion is selectively heat-treated to result in a tensile strength of the aperture portion being 1.2 to 3 times greater than that of the non-aperture portion, and the modulus of elasticity of the aperture portion being 1.5 to 3 times greater than that of the non-aperture portion. The method includes the steps of selectively performing a heat-treating process on only the aperture portion of the shadow mask by mounting a separating cover on the non-aperture portion, the separating cover preventing contact of the non-aperture portion with the gaseous atmosphere present during the heat treating process. The shadow mask is then press-formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile