The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2001

Filed:

Apr. 20, 1999
Applicant:
Inventors:

Arie Harnik, Haifa, IL;

Elie Schwarzfuchs, Hosaya, IL;

Eliezer Iskevitch, Kiryat Motzkin, IL;

Assignee:

Steag CVD Systems, Ltd., Migdal Ha'Emek, IL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A21B 1/00 ;
U.S. Cl.
CPC ...
A21B 1/00 ;
Abstract

Semiconductor processing apparatus, including a chamber, into which a semiconductor wafer is introduced for processing thereof and a heater, which heats the wafer in the chamber. A radiation guide collects thermal radiation from a selected region of the wafer. A wafer support assembly supports the wafer and shields the radiation guide from radiation other than radiation from the region. A pyrometer, coupled to receive the radiation from the guide, analyzes the radiation to determine a temperature of the region, for use in controlling the processing.


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