The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Oct. 04, 1996
Applicant:
Inventors:
Assignee:
Mitsui Chemicals, Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/00 ;
U.S. Cl.
CPC ...
C08K 5/00 ;
Abstract
A method for degrading a polymer by bringing same into contact with a solid phase composed of a carrier, a microorganism and an aqueous solution. The aqueous solution contains nutrients required for the growth of the microorganism and water. The carrier has a maximum water retention of at least 40 wt. % but at most 4,000 wt. %, the aqueous solution is retained in the carrier in an amount of at least 10% but at most 100% of the maximum water retention of the carrier, and the solid phase has a percentage of interstices of 25% or greater but smaller than 100%.
Yagi, Tadashi. (2001). Degrading method of polymer (U.S. Patent No. 6313194). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6313194
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile