The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2001

Filed:

Aug. 14, 2000
Applicant:
Inventor:

Masaru Matsubara, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 3/5587 ;
U.S. Cl.
CPC ...
C04B 3/5587 ;
Abstract

The present invention provides a silicon nitride sintered body having characteristics such as excellent wear resistance, a method for manufacturing the sintered body, and a cutting insert formed thereof. The silicon nitride sintered body is formed of a polycrystalline sintered body of predominantly &bgr;-Si,N,, wherein the oxygen content is 1.2-1.5 wt. %. The method for manufacturing the silicon nitride sintered body includes the following steps: adding an organic binder to a composition containing silicon nitride as an essential component and exhibiting a theoretical oxygen content of 2.0-3.0 wt. %; heating to remove the binder; introducing an oxygen-containing gas so as to control the carbon content to 0.10-0.60 wt. %; and sintering a resultant compact in an nitrogen atmosphere to control the oxygen content to 1.2-1.5 wt. %. The cutting insert of the present invention has excellent wear resistance.


Find Patent Forward Citations

Matsubara, Masaru. (2001). Silicon nitride sintered body, method for manufacturing the same, and cutting insert formed of the sintered body (U.S. Patent No. 6313054). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6313054

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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