The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2001

Filed:

Mar. 05, 1999
Applicant:
Inventor:

Steffen Dubnack, Jena, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 1/818 ;
U.S. Cl.
CPC ...
A61B 1/818 ;
Abstract

A process for monitoring and controlling the adjustment of treatment parameters in an ophthalmic treatment device which comprises a radiation source generating at least a treatment beam and, optionally, a target beam and an applicator which is connected with the radiation source via at least one optical element and can be attached to a slip lamp, wherein the following steps are provided: a) the irradiation parameters such as intensity, magnification of the contact lens placed on the eye, radiation dose per unit area, and spot size on the retina are adjusted by the operator at the radiation source; b) first parameters to be adjusted at the applicator are calculated on the basis of patient-related influencing variables such as contact lens magnification and the size of the spot to be realized on the retina, so that a determined spot size and intensity of the treatment beam to be applied can be realized at the treatment site on the retina; and c) parameters adjusted at the applicator are compared with the first parameters by means of a computer and the adjusted parameters are made to coincide with the first parameters representing reference values, and the parameters serving as reference values are realized and maintained constant for the duration of irradiation. An arrangement for carrying out the process employing an ophthalmic treatment device is also disclosed.


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