The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2001
Filed:
Jun. 03, 1999
Jin-seog Hong, Incheon, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A capacitance gauge tracking apparatus used for an exposure system for manufacturing a semiconductor device, a method for tracking a surface of the semiconductor device, a leveling apparatus and a leveling method are provided. The capacitance gauge tracking apparatus includes a ground unit, a probe unit and a gauge unit. The ground unit is connected to a semiconductor substrate. The probe unit is spaced apart from the surface of the semiconductor substrate to be tracked and a constant current of at least two frequency bands is applied to the probe unit. A constant current of a low frequency is applied to the probe unit to thereby perform global leveling by global tracking of the entire surface of the semiconductor substrate and a constant current of a high frequency is applied to the probe unit to thereby perform local leveling by local tracking on the semiconductor substrate.