The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2001

Filed:

Feb. 15, 2000
Applicant:
Inventors:

Noriaki Hara, Kanagawa-ken, JP;

Somei Yarita, Kanagawa-ken, JP;

Ken Hagiwara, Kanagawa-ken, JP;

Ritsuya Matsuzaka, Kanagawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25C 3/00 ;
U.S. Cl.
CPC ...
C25C 3/00 ;
Abstract

The invention provides a method for producing a sputtering target material including electrolyzing a molten salt mixture containing a precious metal salt and a solvent salt, to thereby deposit a precious metal or a precious metal alloy. The method enables simplification of production steps and produces high-purity target materials. In addition, the electrodeposited precious metal or precious metal alloy is heat-treated at a temperature of at least 800° C. but lower than the melting point of the precious metal, to thereby produce a target material of higher purity.


Find Patent Forward Citations

Hara, Noriaki. (2001). Method for producing sputtering target material (U.S. Patent No. 6309529). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6309529

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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