The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2001
Filed:
Feb. 17, 1999
Applicant:
Inventors:
Masayasu Futagawa, Nabari, JP;
Kiyoshi Mito, Uda-gun, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/404 ; C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/404 ; C23C 1/434 ;
Abstract
A sputtering apparatus for forming a sputtered film on a substrate held on a substrate holder in a vacuum chamber includes a target, a deposition preventing plate provided between the target and the substrate holder, a substrate holder carrying mechanism, and a moving mechanism for moving the substrate holder carrying mechanism to change a distance between the substrate and the deposition preventing plate.
Futagawa, Masayasu. (2001). Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation (U.S. Patent No. 6309525). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6309525
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile