The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2001

Filed:

May. 05, 2000
Applicant:
Inventors:

Masato Okabe, Toyonaka, JP;

Norio Nakata, Toyonaka, JP;

Hiromichi Kurata, Toyonaka, JP;

Takayoshi Masaoka, Toyonaka, JP;

Itsuo Sakai, Toyonaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B 3/510 ; D05B 6/936 ;
U.S. Cl.
CPC ...
D05B 3/510 ; D05B 6/936 ;
Abstract

An interlock stitch sewing machine for blindstitch hemming with a slippage preventing device is provided which is so constructed as to prevent slippage that is likely to occur due to a position error of a lower fabric portion of the fabric portions stacked by a top-stitching at the fabric end, or a locally deformed portion due to a cutting error, in the blindstitch hemming of a tubular article such as T-shirts or underwear. A top-stiching width guide and a fabric edge guide are oppositely disposed in front of a needle location. A slippage detecting sensor that detects the edge position of the lower fabric portion to detect the presence of slippage, is attached to the fabric edge guide. When the slippage quantity detected by the sensor exceeds a permissible slippage quantity, it is determined there is possibility of slippage, and an informing means is operated. Thereby, a faulty sewing such as slippage can be reliably prevented by previously detecting a position error of the lower fabric portion or a deformed portion due to a cutting error.


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