The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Jun. 22, 1999
Akiyoshi Suzuki, Tokyo, JP;
Yoshiyuki Sekine, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate. The projection optical system includes a pair of diffractive members at least one of which is displaced in a direction perpendicular to an optical axis of the projection optical system. Each of the pair of diffractive members has a diffractive surface whose shape is determined so that an optical characteristic of the pair of diffractive members varies when a positional relationship between the diffractive surfaces of the pair of diffractive members in the perpendicular direction varies. An optical characteristic of the projection optical system is adjusted by displacing the at least one of the pair of diffractive members in the direction perpendicular to the optical axis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile