The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2001

Filed:

Oct. 21, 1999
Applicant:
Inventors:

Eiichi Hirai, Tokyo, JP;

Seiji Toda, Kyoto, JP;

Naomasa Oshie, Osaka, JP;

Masayuki Miki, Shiga, JP;

Assignee:

Levex Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 3/108 ; G01R 3/111 ; G01R 2/704 ; G01N 2/700 ;
U.S. Cl.
CPC ...
G01R 3/108 ; G01R 3/111 ; G01R 2/704 ; G01N 2/700 ;
Abstract

While a high-frequency pulse is introduced at one end of a parallel conductor which is simulated as in an impedance equivalent state, an impedance mismatch generator is mounted to an intermediate region of the parallel conductor. As the impedance mismatch generator has produced a reflected wave of the pulse, a duration before the reflected wave is received at the one end is measured and multiplied by the propagation speed of voltage to calculate the distance from the pulse introducing point at the one end of the parallel conductor to the impedance mismatch generator.


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