The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Jan. 22, 1998
Chanfeng Zhao, San Diego, CA (US);
John E. Lillig, Poway, CA (US);
Robert Neeper, Lakeside, CA (US);
Gordon W. Hudson, Vista, CA (US);
Anthony W. Czarnik, San Diego, CA (US);
Zahra Parandoosh, San Diego, CA (US);
Gary S. David, La Jolla, CA (US);
Xiao-Yi Xiao, San Diego, CA (US);
Irori, San Diego, CA (US);
Abstract
Methods for irradiation induced graft polymerization of a monomers, such as styrenes, onto fluoropolymers are provided. The methods, which involve either the use of acids, preferably mineral acids, or creating a rough surface on the fluoropolymer, provide higher levels of grafting of the copolymer than grafting in the absence of the acid or of the rough surface on the fluoropolymer. Also provided are grafted copolymers produced by the methods. Methods for increasing the performance of solid phase assays, such as scintillation proximity assays, are also provided.