The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Apr. 27, 1999
Michael N. Alexander, Lexington, MA (US);
The United States of America as represented by the Secretary of the Air Force, Washington, DC (US);
Abstract
In this invention, one or more metal-containing sources and one or more ammonium halides are heated such that they evaporate into a vacuum environment (except that, in MOMBE, a beam of the organometallic source compound may be created by other means) and made to impinge on a substrate. The materials interact on the substrate to form a film of the desired nitride compound or alloy; the substrate usually will be heated to promote chemical reaction and good film properties such as high crystallinity. Other sources—to provide dopant impurities like silicon or magnesium, for example—would be part of a deposition system envisioned in this invention. Multiple film layers, including quantum wells and superlattices, may be formed using this method, in addition to a single film.