The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Dec. 18, 1998
Dietmar Hellmann, Linsengericht, DE;
Johann Leist, Altenstadt, DE;
Heraeus Quarzglas GmbH, Hanau, DE;
Abstract
A quartz glass component for a reactor chamber, especially of a plasma etching device, comprises a substrate of a first quartz glass quality with an inner surface having an average roughness depth R,of more than 1 &mgr;m, facing the inside of the reactor. To minimize particles in the reactor chamber, and to give the inner surface high adhesiveness for layers deposited on it and a long service life, a roughness zone is formed on the substrate by an open pore bubble layer made of a second quartz glass quality. The quartz glass component may be made by forming a blank from a granulate containing SiO,, and partial or complete vitrification of the blank by heating to a temperature above 1,000° C. During the forming of the inner surface of the blank, an additional constituent is added to the granulate containing siO,in a roughness zone. The additional constituent reacts during the vitrification to release a gas, which forms a bubble layer during vitrification of the roughness zone.