The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Feb. 04, 2000
Linus Albert Fetter, Morganville, NJ (US);
John Z. Pastalan, Hampton, NJ (US);
Agere Systems Guardian Corp., Allentown, PA (US);
Abstract
The invention removes a portion(s) of a material of interest, while leaving an adjacent or underlying electrode(s) intact. The material is exposed to a plasma containing at least two-halogen-containing gases. At least a portion of the material, for example a piezoelectric material, an oxygen-containing material, or a nitrogen-containing material, is etched by the plasma. By removing desired portions of this material, the device can have alternative or complex architecture. In addition, the propagation of shear waves is limited in the device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile