The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2001

Filed:

Jul. 28, 2000
Applicant:
Inventors:

Eugen O. Bergmann, St. George, UT (US);

Richard W. Hsieh, Cranberry Township, PA (US);

John Geibel, Butler, PA (US);

Assignee:

The F. B. Leopold Company, Inc., Zelienopole, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 2/422 ; B01D 2/966 ; B01D 3/348 ; C02F 1/00 ;
U.S. Cl.
CPC ...
B01D 2/422 ; B01D 2/966 ; B01D 3/348 ; C02F 1/00 ;
Abstract

A concurrent backwash distribution apparatus for a filter having a filter tank and a plurality of underdrain laterals includes a baffle positioned in a common main conduit to define an auxiliary flume between the baffle and the underdrain laterals. The auxiliary flume is in fluid communication with the common main conduit and the underdrain laterals. The baffle has at least one flume liquid metering orifice preferably located near the bottom of the baffle so that it may be below a gas/liquid interface in the auxiliary flume during concurrent gas/liquid backwash operations. A flow distribution plate may be positioned between the auxiliary flume and the underdrain laterals, the flow distribution plate having at least one liquid metering orifice and at least one gas metering orifice. The baffle may take one of many forms. The baffle creates an adequate liquid pool in the common main conduit for low velocity flow of backwash liquid while at the same time providing uninhibited flow of backwash gas. Maldistribution is thereby controlled. Stand-pipes may be used in place of the baffle. A method for concurrent gas/liquid backwash according to the invention is also disclosed. The invention may be applied to flat bottom flumes or insufficiently recessed flumes.


Find Patent Forward Citations

Loading…