The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Mar. 24, 2000
Masayasu Suzuki, Emsworth, GB;
Satoko Ishii, Hatano, JP;
Shimadzu Corporation, Kyoto, JP;
Abstract
An ECR plasma apparatus is formed of a vacuum chamber, a cavity disposed at a side surface of the vacuum chamber to which microwave is introduced, an electromagnetic coil disposed around the cavity, and a case member made of a conductive material having the same electric potential as that of the cavity. The case member is disposed in the vacuum chamber adjacent the cavity to supplement resonance operation in the cavity. Thus, the cavity and the electromagnetic coil disposed therearound can be miniaturized and lightened in weight.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile