The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2001

Filed:

Sep. 17, 1999
Applicant:
Inventors:

William L. DeBoynton, Santa Ana, CA (US);

Kurt R. Francis, Yuma, AZ (US);

Scott M. Hellman, Aliso Viejo, CA (US);

Michael Uschitsky, Irvine, CA (US);

Peter G. Wigley, Corning, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/700 ; G02B 1/00 ;
U.S. Cl.
CPC ...
G02B 2/700 ; G02B 1/00 ;
Abstract

A temperature compensated optical filter assembly including a plurality of thin films having temperature dependent indices of refraction which are deposited on a glass substrate so as to form a conventional interference filter thereon. The glass substrate is adhesively coupled to a metal holder such that the deposited thin film interference filter is interposed between the glass substrate and an adhesive layer distributed along a mounting surface of the holder. Thus, a first thermal mismatch stress is applied by the glass substrate onto an inner layer of the interference filter and a second mismatch stress is applied by the holder onto an outer layer of the interference filter, wherein the first and second mismatch stresses depend on the temperature of the filter assembly. The glass substrate, the adhesive, and the holder are preferably formed of materials having mechanical properties such that the first and second mismatch stresses compensate for the effects of the temperature dependent indices of refraction of the thin films so as to uniformly maintain the spectral performance of the filter assembly in response to a change in temperature. In one embodiment, an additional degree of freedom is obtained by electro/magneto-strictively prestressing the thin film stack during the formation thereof. In another embodiment, an active stress management system is utilized.


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