The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2001
Filed:
Feb. 06, 1998
John Star-Lack, Palo Alto, CA (US);
John M. Pauly, San Francisco, CA (US);
Daniel B. Vigneron, Corte Madera, CA (US);
The Board of Trustees of the Leland Stanford Junior University, Stanford, CA (US);
Abstract
The present invention uses spectral-spatial 180° refocusing pulses in the point resolved spectroscopy (PRESS) localization sequence. The PRESS sequence uses a series of three pulses having a tilt angle pattern of 90°-180°-180°. The first excitation pulses in the present invention is a spatially selective 90° tilt angle pulse. The following two pulses are spectral-spatial refocusing pulses which provide multi-dimensional selectivity. This feature allows for enhanced solvent suppression, reduced chemical shift induced spatial displacement and an ability to refocus weakly coupled spins. In a preferred embodiment, the spectral-spatial pulses are time-asymmetric and identical, providing for a linear phase profile by means of phase compensation between the two refocusing pulses. Alternatively, a linear phase profile can be provided by using time-symmetric refocusing pulses. The time-asymmetric feature is preferred because it results in lower applied RF power and shorter echo times.