The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2001
Filed:
Aug. 31, 1999
Hiroyuki Hieda, Yokohama, JP;
Takashi Ishino, Kawasaki, JP;
Kuniyoshi Tanaka, Miura, JP;
Katsuyuki Naito, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
The present invention provides a pattern forming method including the steps of forming a first thin film on an object to be etched, forming a first surface region and a second surface region on a surface of the object by modifying or removing a portion of the first thin film, the first and second surface regions differing from each other in the surface state, forming a second thin film on the first surface region by utilizing the difference in the surface state between the first and second surface regions, the second thin film being amorphous and thicker than the first thin film, and etching the object using the second thin film as an etching mask.