The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2001
Filed:
Nov. 13, 1998
Chiu Ping Wong, Vadnais Heights, MN (US);
Thomas P. Hanschen, St. Paul, MN (US);
Anthony B. Ferguson, Lake Elmo, MN (US);
William W. Merrill, White Bear Lake, MN (US);
Fred J. Roska, Woodbury, MN (US);
Jeffery N. Jackson, Woodbury, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
A method of biaxially stretching a polymeric film according to an overbias or overstretch stretch profile to a final first direction stretch parameter and a final second direction stretch parameter to provide a film having uniform properties. First, a sufficiently high temperature is imparted to the film to allow a significant amount of biaxial stretch. The film is then biaxially tenter stretched to a peak first direction stretch parameter that is at least 1.3 times the final first direction stretch parameter wherein the final first direction stretch parameter is no larger than the final second direction stretch parameter. Finally, the film is retracted in the first direction from the peak first direction stretch parameter to the final first direction stretch parameter to produce a film having uniformity of properties in the first direction.