The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Sep. 30, 1998
Applicant:
Inventors:
Paul S. Fechner, Plymouth, MN (US);
Gregory D. Dougal, Minneapolis, MN (US);
Keith W. Golke, Minneapolis, MN (US);
Assignee:
Honeywell Inc., Morristown, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/900 ;
U.S. Cl.
CPC ...
H01L 2/900 ;
Abstract
A method for forming a frontside substrate contact on a Silicon-On-Insulator wafer in the presence of planarized contact dielectric is described. The method offers the improvement of reducing the etch selectivity requirements while allowing simultaneous etching and metallization of gate, source, drain and substrate contacts.