The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Jul. 14, 1999
Applicant:
Inventor:
Chi-Fung Lo, Fort Lee, NJ (US);
Assignee:
Praxair S.T. Technology, Inc., North Haven, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 3/12 ; B22F 3/14 ;
U.S. Cl.
CPC ...
B22F 3/12 ; B22F 3/14 ;
Abstract
A method is provided for fabricating Cu/Cr sputter targets having a density of at least about 90% of theoretical density and an oxygen content of less than about 1000 ppm. According to the principles of the present invention, Cu and Cr powders, each having particles in the size range of about 20 &mgr;m to about 150 &mgr;m and having oxygen contents preferably less than about 1200 ppm and 600 ppm, respectively, are blended and pressed by hot pressing. A low-oxygen content, high-density Cu/Cr target is thereby achieved for the sputtering of thin films having a defect generation of about 0%.