The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2001

Filed:

Dec. 16, 1999
Applicant:
Inventors:

Masakazu Takamura, Koube, JP;

Hitoshi Yoshida, Iwaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 7/134 ;
U.S. Cl.
CPC ...
B01D 7/134 ;
Abstract

A porous hollow fiber polyvinylidene fluoride resin membrane, characterized in that the membrane has a unitary three-dimensional network structure entirely composed of a polyvinylidene fluoride resin and has an inside diameter of 1.5-5 mm and a wall thickness of 0.5-2 mm and in that the relationship between membrane bubble point and water flux per unit wall thickness is on or above the curve shown in FIG.


Find Patent Forward Citations

Takamura, Masakazu. (2001). Porous polyvinylidene fluoride resin film and process for producing the same (U.S. Patent No. 6299773). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6299773

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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