The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Oct. 15, 1999
Klaus Schubert, Karlsruhe, DE;
Wilhelm Bier, Eggenstein-Leopoldshafen, DE;
Gerd Linder, Karlsruhe, DE;
Erhard Herrmann, Leverkusen, DE;
Bernd Koglin, Bergisch Gladbach, DE;
Thomas Menzel, Hilden, DE;
Christine Maul, Köln, DE;
Bayer Aktiengesellschaft, Leverkusen, DE;
Abstract
In the reaction process, at least two educts A, B are divided by a system, assigned to each of them, of slit-like microchannels,into spatially separate fluid lamellae, which then emerge into a common mixing and reaction space,. The fluid lamellae here have a thickness <1,000 &mgr;m, preferably <100 &mgr;m, at a width thickness ratio of at least 10. It is essential here that educts A, B can emerge as thin fluid lamellae,into the mixing/reaction space,, each fluid lamella,of an educt A being led into the mixing/reaction space,in the immediate vicinity of a fluid lamella,of another educt B. The adjacent fluid lamellae,then subsequently mix by diffusion and/or turbulence. As a result, the mixing operation is accelerated substantially compared with conventional reactors. In the case of rapid chemical reactions, the formation of undesirable by-products or secondary products is largely prevented in this manner.