The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Mar. 10, 1997
Anton Heger, Eindhoven, NL;
Edward W. A. Young, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
An electrically resistive structure comprising a substrate (,) which is provided on at least one side with a first resistive film (,) and a second resistive film (,), the materials of these first and second films (,) being mutually different, whereby an anti-diffusion film (,) is disposed between the first and second films (,). The presence of such an anti-diffusion film (,) allows annealing of the resistive structure without significant degradation of its resistive properties. Suitable alloy materials for use in such an anti-diffusion film (,) include WTi, and particularly WTiN. Appropriate exemplary materials for the first resistive film (,) and second resistive film (,) include SiCr and CuNi alloys, respectively.