The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Jul. 27, 1998
Applicant:
Inventors:
Pawitter J. S. Mangat, Chandler, AZ (US);
C. Joseph Mogab, Austin, TX (US);
Kevin D. Cummings, Phoenix, AZ (US);
Allison M. Fisher, Tempe, AZ (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1312 ; G03F 9/00 ;
U.S. Cl.
CPC ...
H01L 2/1312 ; G03F 9/00 ;
Abstract
A passivating layer (,) is formed overlying portions of a mask (,). The mask (,) is used to pattern a semiconductor device substrate (,). In accordance with one embodiment of the present invention, the passivating layer (,) is removed prior to patterning the semiconductor device substrate (,). In yet another embodiment, the passivating layer (,) is cleaned prior to patterning the semiconductor device substrate (,) and then left to remain overlying portions of the mask (,) during the patterning process.