The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Mar. 11, 1999
Applicant:
Inventors:
Suryanarayan G. Hegde, Hollowville, NY (US);
Kam Leung Lee, Putnam Valley, NY (US);
Jack A. Mandelman, Stormville, NY (US);
Carl J. Radens, LaGrangeville, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ;
U.S. Cl.
CPC ...
H01L 2/18242 ;
Abstract
Excimer laser annealing is employed to improve the flexibility of gate activation and source/drain activation as well as to limit the extent of decomposition of a high dielectric constant storage capacitor in fabricating trench storage semiconductor memory devices.
Hegde, Suryanarayan. (2001). Application of excimer laser anneal to dram processing (U.S. Patent No. 6297086). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6297086
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile