The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Jul. 22, 1998
Ronald W. Wake, Hilton, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method of making a solid state image sensor having a color filter array with color filter elements having a plurality of different types of colored pixels embedded in a planar surface, the method includes providing a first transparent layer covering the pixels; making the first transparent layer optically planar by chemical mechanical polishing; and uniformly depositing a second transparent etch-stop layer over the first transparent layer. The method further includes uniformly depositing a third support layer over the second transparent etch-stop layer which is made of a different material than the second transparent etch-stop layer; etching openings into the third support layer in regions where color filter elements are desired to be formed; conformably coating a photoresist layer in the openings on the top surface of the second transparent etch-stop layer and on the top surface of the third support layer; patterning the photoresist layer to remove portions of the photoresist layer corresponding to the first type of colored pixels; coating the photoresist layer and the second transparent etch-stop layer in the patterned opening portions with color filter material of the first color type corresponding to the first type of colored pixels; removing the first type of color filter material from positions where it was coated over the photoresist layer.