The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2001

Filed:

Jan. 14, 1999
Applicant:
Inventor:

William David Reents, Jr., Middlesex, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 3/338 ;
U.S. Cl.
CPC ...
G01N 3/338 ;
Abstract

A small sample of a refractory material, e.g., about 0.1 g to about 10 g, is heated to at least 1000° C., generally under a pressure of less than about 10,Torr. Evolved hydrogen-containing gases and/or carbon-containing gases are monitored, e.g., by mass spectrometry, and, based on the amount of the evolved gases, the concentration of hydrogen and/or carbon in the sample is calculated. It is therefore possible to accurately determine the hydrogen and carbon concentration from a small sample of a material, by a process much less burdensome than conventional techniques.


Find Patent Forward Citations

Reents, Jr., William. (2001). Process for determining impurities in refractory materials (U.S. Patent No. 6297058). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6297058

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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