The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Nov. 03, 1999
Koji Kaise, Saitama-ken, JP;
Toshio Tsukakoshi, Saitama-ken, JP;
Tsunehito Hayashi, Saitama-ken, JP;
Nikon Corporation, Tokyo, JP;
Abstract
The aberration measurement method can determine an aberration from a width of an image of a pattern line on a resist or from a ratio of light quantities upon measuring an amount of the aberration of the image formed by an optical projection system. This method further can measure an amount of a deviation of a position of the image of the pattern on the resist so that it can solve laborious work otherwise required by conventional technology that uses a complicated microscope such as a scanning-type electronic microscope. Moreover, the aberration can be determined by measuring a pitch width of a whole line-and-space pattern containing wedge-shaped lines or lengths of the wedge-shaped lines. This does not require to learn the absolute position of the image because a difference between the amounts of deviation of the positions of the different pattern images so that no such complicated microscope is not required. In addition, as an error of superimposition of the patterns can be corrected by an image of a comparison pattern, no laborious attention is any longer paid to alignment of the patterns, thereby allowing a measurement of the amount of the aberration with an optical projection system or by other means at a high speed and with high precision.