The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Nov. 18, 1999
Applicant:
Inventors:
Assignee:
National University of Singapore, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 1/508 ;
U.S. Cl.
CPC ...
B01D 1/508 ;
Abstract
Novel and improved chiral stationary phases (CSP) materials comprising a support and completely regiodefined derivitised cyclodextrin chemically bonded via single or double urethane linkage(s) universally applicable in HPLC, LC, TLC, and CCE are obtained using a process based on the almost quantitative reaction of pre-synthesized regiodefined per-functionalized mono- or di- azidocyclodextrin with primary amines.