The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Feb. 25, 1999
Douglas C. Allan, Corning, NY (US);
William R. Powell, Elmira, NY (US);
Nicholas F. Borrelli, Elmira, NY (US);
Thomas P. Seward, III, Alfred, NY (US);
Charlene M. Smith, Corning, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
A fused silica glass which exhibits low compaction when exposed to high intensity excimer radiation, also exhibits low optical path distortion after exposure to a high intensity radiation dose. Also disclosed is a method for improving the select ratio of fused silica glass for photolithography, by predicting the optical path distortion of the glass under use by determining the intrinsic densification of the glass at a given number of pulses and fluence per pulse. Mathematical modeling methods are also disclosed for use in producing a fused silica stepper lens having low compaction under high intensity excimer radiation; and for determining optical path distortion caused by high energy radiation in fused silica glass.