The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
Jan. 26, 1998
Applicant:
Inventors:
Ian D. Walton, Redwood City, CA (US);
Mark O. Trulson, San Jose, CA (US);
Richard P. Rava, Redwood City, CA (US);
Assignee:
Affymetrix, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12Q 1/68 ; G01N 2/186 ; G02B 2/100 ; G01J 3/00 ; C07H 2/104 ;
U.S. Cl.
CPC ...
C12Q 1/68 ; G01N 2/186 ; G02B 2/100 ; G01J 3/00 ; C07H 2/104 ;
Abstract
A system and method for imaging a sample labeled with a material having a strong light scattering and reflecting properties are provided. A typical material having strong light scattering and reflecting properties is a metal colloid. The imaging system employs a light scattering and reflecting illumination technique. The sample can be imaged with reflection mode imaging along or with a combination of reflection mode and scatter mode imaging.