The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
Feb. 22, 2000
Applicant:
Inventor:
Bernhard Weigl, Steinheim, DE;
Assignee:
Carl-Zeiss-Stiftung, Heidenheim, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G01B 1/100 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G01B 1/100 ;
Abstract
In a method for mutually aligning a mask pattern formed in a mask,and a substrate,on which the mask pattern is to be imaged, by using setting marks,and,or,in the mask,and in the substrate,the alignment is performed with the aid of an imaging system and a light beam with polarized light,A phase shift for the first diffraction orders,is undertaken in the beam path,Higher diffraction orders,and unwanted light are filtered out after the phase shift, and after the filtering out the light beams of the first diffraction orders,are detected, and the result is evaluated for the purpose of alignment.