The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
May. 14, 1999
Volker Paquet, Mainz, DE;
Schott Glaswerke, Mainz, DE;
Abstract
The apparatus for coating or treating a substrate in a remote plasma CVD process includes a reaction chamber for the substrate; modular plasma source devices for exciting an excitation gas, preferably with microwaves, to form a plasma in the excitation gas arranged, either in a linear arrangement or in a two-dimensional planar array, over the substrate; devices for conducting a reactant gas over the substrate in the reaction chamber and for mixing the excitation gas containing the plasma with the reactant gas in the reaction chamber in the presence of the substrate and a device for removing exhaust gas from the reaction chamber. A device is provided for moving the substrate relative to the plasma source devices in a motion direction at an angle to the long axis of the arrangement or array of plasma source devices to minimize edge effects.