The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2001

Filed:

Nov. 09, 1999
Applicant:
Inventors:

Sung-min Cho, Seoul, KR;

Won-hyung Lee, Seoul, KR;

Hwan-young Choi, Anyang, KR;

Moon-gyu Lee, Suwon, KR;

Jee-hong Min, Yongin, KR;

Young-il Kim, Yongin, KR;

Jin-seung Choi, Suwon, KR;

Jae-yong Eum, Suwon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/32 ;
U.S. Cl.
CPC ...
G02B 5/32 ;
Abstract

A beam scanning system including: a light source; a deflection disc rotatably installed over the light sources and having a hologram pattern on each of the upper and lower surfaces thereof, for diffracting beams emitted from the light source; and a plurality of mirrors for reflecting beams that have been diffracted by the deflection disc, to change the diffracted paths of the beams. Each of the upper and lower hologram patterns is formed with a low density relative to a one-sided hologram pattern.


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