The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2001
Filed:
Sep. 30, 1998
Daihen Corp., Osaka, JP;
Abstract
A plasma monitoring apparatus for monitoring a condition of plasma of a plasma load to which power is supplied from a high frequency power source through an impedance matcher provides with a first input impedance calculator for calculating an impedance as a first input impedance from a supply-side terminal of the matcher to the plasma load-side based on voltage, current and phase difference detected at the supply-side terminal of the matcher, a second input impedance calculator for calculating an impedance as a second input impedance from a load-side terminal of the matcher to the plasma load based on a impedance of a element of the matcher and the first input impedance and a plasma impedance calculator for calculating an impedance of the plasma load from the second input impedance and an impedance of a supply-side connecting the matcher and the plasma load.