The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2001
Filed:
Nov. 19, 1999
Applicant:
Inventors:
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 3/300 ; H01L 2/900 ;
U.S. Cl.
CPC ...
H01L 3/300 ; H01L 2/900 ;
Abstract
A semiconductor device is implemented having dummy patterns arranged by designedly determining the ratio of area occupied by a protruded portion of an element formation region considering the deposited state of a buried insulating film which becomes an isolation insulating film. The ratio of area occupied by a protruded portion of a dummy pattern to a predetermined cell region is defined to be almost the same as the maximum or average value of ratios of areas occupied respectively by protruded element formation regions to a plurality of predetermined regions each including a plurality of predetermined cell regions.