The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2001

Filed:

May. 01, 1995
Applicant:
Inventors:

YongFeng Lu, Singapore, SG;

Yoshinobu Aoyagi, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 2/600 ;
U.S. Cl.
CPC ...
B23K 2/600 ;
Abstract

An apparatus for dry cleaning a surface includes a laser generator, a laser beam homogenizer, an aperture and a lens that are controlled by a CPU. The laser is preferably a KrF excimer laser although any laser capable of generating a pulsed output in the ultraviolet spectrum may be used. The lens is preferably a plano-convex lens. Articles to be cleaned are placed on a conveyor that transports the article through the laser beam. The CPU can store parameters for optimizing removal of a particular contaminant. These parameters may include the frequency of the pulse beam generated by the laser, the shape of the aperture, the position of the lens is controlled by a stage, and the speed of the conveyor belt.


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