The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2001
Filed:
Jun. 29, 2000
Applicant:
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 5/00 ;
U.S. Cl.
CPC ...
F27D 5/00 ;
Abstract
Heating (,) a semiconductor wafer (,) in a process chamber (,) is performed in the order of: placing (,) the wafer (,) with the backside (,) on a plurality of support elements (,) that extend from a chuck (,); ejecting (,) a heating gas (,, He) from a shower head (120) located within the process chamber (,) to the frontside (,) of the wafer (,); and moving (,) the support elements (,) into recesses (,) within the chuck (,) to that the wafer backside (,) touches the chuck (,).
Quick Actions:
Shahvandi, Iraj. (2001). Method for heating a semiconductor wafer in a process chamber by a shower head, and process chamber (U.S. Patent No. 6290491). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6290491
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile