The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Aug. 16, 2000
Andrew J. Daiber, Palo Alto, CA (US);
Mark E. McDonald, Mountain View, CA (US);
Siros Technologies, Inc., San Jose, CA (US);
Abstract
A positive unit magnification reflective head is used to back-reflect a primary light beam, for storing reflection microholograms at the coincident foci of the primary and reflected beams. Imaging the primary beam focus onto itself at positive unit magnification allows increasing system tolerance to tilts and transverse misalignments between the primary and reflective heads. Holograms are stored at multiple depths in a holographic storage medium. Tunable-focus primary and reflective heads are positioned on opposite sides of the storage medium. The reflective head images each storage location onto itself at positive unit magnification. Suitable reflective heads include: two lenses in an f-2f-f configuration and a planar mirror; a lens and a corner cube; a thin lens and a thick lens with a coated reflective back surface; and a thin lens and a back-coated gradient-index (GRIN) lens. To control the polarization of the reflected beam, the corner cube may include a plastic filler bonded on the back of the reflective surface. The filler index of refraction is chosen such that the primary beam is incident on the reflective surface of the corner cube at the critical angle.